Helia’s in-house photolithography capability adds new dimensions to the substrates & devices that we can deliver. Using photomasks to pattern our coatings is an enabling technology for realising complex device such as sensors, creating mosaic filters on the same substrate or for protecting sections of wafers from being coated.
Spinner, UV mask aligner & lift-off facilities allow Helia to pattern a variety of substrates up to 6″ with positive or negative photoresist to different thicknesses. Our in-house CAD means that we can work with you to design patterns that are customised to your research requirements. Fine features down to less than 5μm or coarse features of a few mm can be created in this way.